Semiconductor

Semiconductor

Improve your process yield with complete solutions for advanced semiconductor manufacturing.

In semiconductor fabs, microcontamination can pose massive problems. Camfil offers an extensive range of solutions – particle pre-filters, HEPA and ULPA filters and AMC control solutions – to lower any cleanroom particulate and molecular concentrations to ISO Class 1 levels for particles and sub-ppb for AMC.

AMC filters and control more critical than ever in cleanroom filtration

Airborne molecular contamination (AMC) presents a special challenge to semiconductor manufacturing in small dimensions. The undesired chemical reactions of acids, bases, organics, refractories and dopants can affect wafer surfaces and process equipment optics to create defects during chip production and reduced equipment and tool efficiency.

AMC is steadily becoming more important in critical cleanroom manufacturing processes. As specifications become more demanding and device sizes shrink, process control faces tremendous pressure. Wafers can spend an entire month inside a factory, undergoing hundreds of processes before being shipped in a final product. Any tiny contamination impact in this process chain can have serious consequences for the fab’s overall yield. 

Protect your process equipment and wafers against nanoparticles and airborne molecular contaminants

Camfil solutions provide field- and lab-proven protection in semiconductor manufacturing environments, including lithography, etch, diffusion, metallization, thin films, ion implantation, inspection tools, and reticle or wafer storage areas.

  • Process tool air filters
  • Cleanroom air filters
  • Scanner prefiltration systems

Energy-efficient and low-outgassing solutions for facility systems

Camfil’s particle pre-filter range ensures the lowest energy usage in make-up air handling units while protecting HEPA filters from clogging and without releasing Boron. Camfil HEPA and ULPA filters are designed to release the lowest possible amounts of organic contaminants (so-called low outgassing), following years of developments of adhesives and media chemical properties.

  • Boron-free synthetic pre-filters
  • Very low energy pre-filters
  • Low outgassing HEPA and ULPA filters
  • Dust collectors and gas scrubbers for cleaner exhaust air